In this paper, reflectance and transmittance of Silicon nanostructure array obtained from simulation of various textured structure has been presented. These nanostructures reduce the reflections and enhance the antireflection property of solar cells. We reviewed various fabrication methods used for nanoscale antireflection structures. Generally fabrication of nanoscale structure is done by two approaches: top-down approach and bottom-up approach. Commonly used fabrication methods include chemical vapour deposition, wet etching and dry etching. The silicon nanostructures has a square geometry which has a height of 1μm and diameter of 0.5μm. The refractive index of Si nanocones is taken as 3.85. Reflectance and transmittance has been observed in the visible spectrum for wavelength 0.5μm through simulation software OptiFDTD.