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We describe a modified local oxidation of silicon process as a platform for the fabrication of waveguides and ultra-high Quality factor (5.3·10) silicon resonators, with nearly fully planar interface for multilayer silicon integration.
Department of Applied Physics, The Benin School of Engineering and Computer Science, The Center for Nanoscience and Nanotechnology, The Hebrew University of Jerusalem, Israel, 91904
Department of Applied Physics, The Benin School of Engineering and Computer Science, The Center for Nanoscience and Nanotechnology, The Hebrew University of Jerusalem, Israel, 91904
Department of Applied Physics, The Benin School of Engineering and Computer Science, The Center for Nanoscience and Nanotechnology, The Hebrew University of Jerusalem, Israel, 91904
Department of Applied Physics, The Benin School of Engineering and Computer Science, The Center for Nanoscience and Nanotechnology, The Hebrew University of Jerusalem, Israel, 91904