In this work, different configurations of IT-SOFC complete cells: ITM porous support / Ni-YSZ / YSZ / La2NiO4 with and without GDC protective layers were realized by two different surface treatment processes. The porous anode layer was deposited by Atmospheric Plasma Spraying (APS). The thin, dense and columnar electrolyte layer was deposited by reactive magnetron sputtering (PVD) with PEM system. The K2NiF4 dense cathode layer and GDC protective layers were also deposited by PVD. Morphological characterizations were performed after each step of the cell manufacture.