In this paper, we have investigated the effect of drain doping profile on a double-gate tunnel field-effect transistor (DG-TFET) and its radio-frequency (RF) performances. Lateral asymmetric drain doping profile suppresses the ambipolar behavior, improves OFF-state current, reduces the gate–drain capacitance, and improves the RF performance. Further, placing the high-density layer in the channel near the source–channel junction, a reduction in the width of depletion region, improvement in ON-state current $(I_{{\rm ON}})$ , and subthreshold slope are analyzed for this asymmetric drain doping. However, it also improves many RF figures of merit for the DG-TFET. Furthermore, lateral asymmetric doping effects on RF performances are also checked for the various channel length. Therefore, this paper would be beneficial for a new generation of RF circuits and systems in a broad range of applications and operating frequencies covering RF spectrum. So, the RF figures of merit for the DG-TFET are analyzed in terms of transconductance $(g_{m})$ , unit-gain cutoff frequency $(f_{T})$ , maximum frequency of oscillation $(f_{{\rm max}})$, and gain bandwidth product. For this, the RF figures of merit have been extracted from the Y-parameter matrix generated by performing the small-signal ac analysis. Technology computer-aided design simulations have been performed by 2-D ATLAS, Silvaco International, Santa Clara, CA, USA.