Moving-magnet magnetically levitated planar motors are considered for use as a wafer stage in the semiconductor lithographic industry. This puts high requirements on the accuracy and the dissipated power and cooling performance of such motors. A novel planar motor topology is developed, which consists of a double layered coil structure and is therefore referred to as Double Layer Planar Motor. This planar motor is analyzed using an electromagnetic model, a mechanical model, and a thermal model. This behavior is evaluated using a trajectory and performance criteria which are representative for the application. Both the static and the dynamic behavior is evaluated. Measurements on a prototype are presented.