Overdamped Josephson junctions based on a superconductor—normal metal—insulator—superconductor structure were realized at the submicrometer scale by using focused ion beam nano-sculpting technique. This approach represents an alternative solution to the classical electron beam lithography and allows for an accurate control of the junction dimensions. Superconductor—normal metal—insulator—superconductor structured junctions were downscaled to about and electrically measured at 4.2 K. The simple fabrication process, leading to high current density, , and characteristic voltage, , values and good uniformity, makes these junctions promising as elementary cell in complex circuits for rapid single flux quantum and ac voltage standard applications.