Using low-temperature plasma-enhanced chemical vapor deposition, a silica-based arrayed-waveguide grating (AWG) filter has been monolithically integrated with germanium photodiodes on a silicon-based photonic platform. All the outputs of a 16-channel AWG with 200GHz spacing have been equipped with germanium photodiodes. All wavelength channels of the integrated device were confirmed to function as a wavelength-division-demultiplexing receiver for 1.25-Gbps PRBS signals. In addition, we have successfully mounted multi-channel transimpedance amplifiers and limiting amplifiers on the integrated photonic device using flip-chip bonding technology.