■ ST has 10 years experience with FDSOI ▪ Research program on 3 sites: Crolles, LETI & ANT ▪ Collaboration with SOITEC for wafer supply ■ Several technology elements have already been demonstrated ▪ Process modules (STI, Gate materials, USJ, Ground plane, Hybrid) ▪ Vth adjustement strategy ▪ Body bias capability ▪ On-Silicon Performance capability over 28LP ■ Move from R&D to Industrial Process of 28FD technology is for us (and our Partners) an efficient and strightforward response to the world-wide competition ■ Extension of FDSOI towards 20nm and 14nm nodes is also in preparation ▪ with new bossters to further increase of the performance growth rate