Electron and ion beams are widely utilized in both fabrication and analysis of semiconductor devices. This talk will highlight examples of device edit and repair using Focused Ion Beams (FIB) for high resolution sputtering for cross sectional imaging, ion beam induced deposition and etch for device modification and repair, and the use of electron beams for fabrication, inspection and analysis. Specific applications examples will include integrated circuits, MEMS devices, plasmonic sensors and light emitting diodes.