Intra-die manufacturing variations are unavoidable in nanoscale processes. These variations often exhibit strong spatial correlation. Standard grid-based models assume model parameters (grid-size, regularity) in an ad hoc manner and can have high measurement cost. The random Leld model overcomes these issues. However, no general algorithm has been proposed for the practical use of this model in statistical CAD tools. In this paper, we propose a robust and efficient numerical method, based on the Galerkin technique and Karhunen Loeve Expansion, that enables effective use of the model. We test the effectiveness of the technique using a Monte Carlo-based Statistical Static Timing Analysis algorithm, and see errors less than 0.7%, while reducing the number of random variables from thousands to 25, resulting in speedups of up to 100 x.