This article reviews the transition-metal complexes of rhodium, palladium and platinum which were described in the literature as volatile. A classification has been adopted according to the ligands borne by each metal center, and the preparation procedures have been given. As the general aim of the review is to use the most convenient complexes for chemical vapor deposition, the yields of the syntheses and the stability and/or sensitivity of the complexes have been emphasized. When appropriate, their use in CVD and a detailed description of the resulting deposits have been reported. Challenges for researchers in the field are discussed.