The polymer ethylenetetrafluoroethylene (ETFE) is composed of alternating ethylene and tetrafluoroethylene segments. Because it has applications in areas such as medical physics and industrial coatings, there is a great interest in surface modification studies of ETFE polymer. When this material is exposed to ionizing radiation it suffers damage that depends on the type, energy and intensity of the irradiation. In order to determine the radiation damage mechanism from exposure to low voltage plasma, ETFE films were exposed to residual gas plasma in glow discharge regime to a fluence of 2×10 17 ions/cm 2 . Irradiated films were analyzed with optical absorption photospectrometry, Fourier transform infrared (FTIR) and Raman spectroscopy to determine the chemical nature of the structural changes caused by low energy glow discharge.