One of the main factors influencing the electrical properties of Atomic Layer Deposited (ALD) high-k materials is the precursor used during the growing process, which must provide good thermal stability to withstand the high temperatures used during the manufacturing process. In this work, the electrical properties of ALD-grown HfO 2 ultra-thin films using different precursors were investigated at both, the nanoscale (using the Conductive Atomic Force Microscope, CAFM) and at the device level, which can give complementary information about the quality of the high-k layer. The effect of an annealing process above 1000°C (before or after the gate electrode deposition) was also considered.
Financed by the National Centre for Research and Development under grant No. SP/I/1/77065/10 by the strategic scientific research and experimental development program:
SYNAT - “Interdisciplinary System for Interactive Scientific and Scientific-Technical Information”.