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An ASV procedure featuring a new tellurium film electrode deposited in-situ on a glassy carbon substrate in 0.1M HCl is presented. The electrochemical behavior of the tellurium film electrode with regard to its applicability in the ASV determination of copper(II) was thoroughly studied and discussed. It was found that during the accumulation step in 0.1M HCl, Cu(II) is co-deposited with tellurium...
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