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In this work, the influence of the c-Si surface finishing (hydrophobic/hydrophilic) prior to the deposition of the Al2O3 passivation layer on the passivation quality is investigated. The samples are characterized by a combination of Quasi-Steady-State-PhotoConductance (QSSPC) Capacity-Conductance (CV), X-ray Photoelectron Spectroscopy (XPS) and Fourier Transformed InfraRed (FTIR) measurements. Furthermore,...
We present a detailed study about the influence of post-deposition temperature treatment on PECVD Al2O3 passivation layers. Fourier transform infrared spectroscopy (FTIR) and quasi-steady-state photoconductance (QSSPC) were applied for characterization. We observed several indications of structural changes of the Al2O3 layer with annealing duration, temperature and layer thickness. A shift and an...
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