Titanium dioxide (TiO 2 ) thin film was synthesized on α-Al 2 O 3 (0001) substrate by liquid sprayed mist chemical vapor deposition under 1atm. Tetraethylorthotitanate [TEOT, (C 2 H 5 O) 4 Ti] was used as starting material. The liquid source to synthesize TiO 2 thin film was prepared from dissolving the starting materials in 2-methoxyethanol. The TiO 2 thin film was obtained as the amorphous phase at 300 o C and crystalline anatase type TiO 2 above 400 o C. The crystal of thin film was mainly oriented to (112) plane. The degree of (112) orientation, the thickness, and the surface roughness of the film were strongly dependent on the substrate temperature and deposition time. By the controlling the substrate temperature and deposition time, TiO 2 /α-Al 2 O 3 (0001) films with preferred orientation were successfully fabricated, and the film deposition rate was about 10nm/min.