The characteristics and use of the first plasma source ion implantation (PSII) device (PSII-EX) put into operation in the Southwestern Institute of Physics (SWIP) in 1993 are described. Experiments performed with this device have demonstrated its use for achieving good uniform surface-modification properties of materials via ion implantation. These properties include improvements in surface microhardness, friction and the biological compatibility of Ti alloy materials. In addition, PSII treatment of practical workpieces, such as cutting tools, measuring tools and bearings, have also led to substantial improvements in wear life. Surface analyses of treated samples have been performed using TEM, AES, XPS and RBS. Computer simulation of the PSII process has been used to assist our research. PSII technology is being developed for industrial and commercial applications via a novel industrial PSII machine and new modification techniques that are being developed using this machine at SWIP.