This study shows the results obtained in the direct electrodeposition of CuFeO 2 thin films from a DMSO based solution. First, a detailed electrochemical study was carried out in order to determinate the best condition for the CuFeO 2 electrodeposition. The films were obtained potentiostatically from a 0.01M CuCl 2 +0.005M Fe(ClO 4 ) 3 +0.1M LiClO 4 solution in the presence of molecular oxygen at 50°C onto FTO/glass substrates. In all cases, the time of electrodeposition was 1000s. The grown films presented a yellow-reddish color and exhibit an homogeneous aspect. Analyses of composition carried out through EDS, shown that a stoichiometric composition (atomic relation Cu:Fe=1:1) is obtained at a potential of –0.6V. However, as-grown films analyzed through XRD experiences did not evidence the presence of CuFeO 2 compound presumably because it is amorphous. An annealing treatment at 650° C for 30minutes in an argon atmosphere was necessary to transform the solid phase of the as grown films in crystalline CuFeO 2 . Furthermore, the presence of CuFeO 2 has been confirmed through XPS analyses. UV-vis analyzes shown a ladder-like appearance due to the presence of several absorption edges from the IR to the UV spectrum region. The most clearly determined were a direct-like edge at the IR: E g (IR)=1.64eV. However, several absorption edges in the visible (E g dir (vis)=2.35eV, and E g ind (vis)=2.03eV) and UV beginning (E g ind (UV)=3.37eV) spectrum region also were observed.