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To investigate the role of nano-Cr 2 O 3 particles on the erosion–corrosion behavior of composite alloying layer, a nano-Cr 2 O 3 particles reinforced Ni-based composite alloying layer was fabricated onto AISI 316L stainless steel (SS) via a duplex surface treatment, consisting of Ni/nano-Cr 2 O 3 predeposited by electric brush plating, and subsequent...
During low pressure ionized metal physical vapor deposition (PVD) of Cu seed layer for microprocessor interconnects, the re-deposited Cu film on the hollow cathode magnetron (HCM) target may fall off and damage the Cu film on the wafer. An analytical view factor model based on the analogy between metal sputtering and diffuse thermal radiation was used to obtain re-deposition profiles for HCM targets...
Changes in the temperature of nanocrystalline SiC film surface were measured during film growth by direct deposition of carbon and silicon ions onto substrates at ∼800 °С. It has been found that the initial stage of the film growth is characterized by uncontrolled variations of the surface temperature, which are observed for constant values of the deposition parameters. The energy components of the...
Sb-doped ZnO film was obtained by CVT technique in a closed tube, and the temperature dependence of its photoluminescence spectrum was also investigated. The Sb-related photoluminescence peaks were observed. The peaks occurred at 3.352, 3.312, 3.240 and 3.168 eV were respectively assigned to the neutral acceptor-bound excition, free electron to acceptor transitions, and the first- and second- longitudinal...
We compare two ways to control the distribution function of ions on the isolated structure which is treated in a plasma reactor based on beam plasma discharge. In the first case, the periodic pulse voltage is applied to the substrate holder. The calculation of currents and voltages on the surface in contact with the plasma in a simple empirical model has been performed; the comparison of results of...
Tantalum silicide (TaSi 2 ) thin films were deposited on n-type silicon single crystal substrates using a dual electron-gun system and with Ta and Si targets. The thicknesses of TaSi 2 thin films considered in this study are in the range 200–500 nm, respectively. The TaSi 2 /Si samples were annealed at temperature 1173 K for 2 h in a vacuum of 10 −8 mbar. The structure...
We present the update on the emission characteristics and results from previously reported (Vacuum 77 (2004) 19–26), experimental study of axial point source thermionic electron beam emitter assembly. Emission characteristics for this gun have been presented. Optimal conditions to obtain the requisite beam characteristics for welding of refractory metals at 10 keV energy are reported.
Electron Energy Loss Spectroscopy has been employed for investigation of the electronic states of amorphous and crystalline Fe 73.6 Cu 1 Nb 2.4 Si 15.8 B 7.2 (FINEMET) alloy surface and alloy components. Electron energy losses have been measured for primary electron beam energies E 0 from 150 to 650 eV. The characteristic energy loss spectra were composed...
Diamond-like carbon films have unique properties for biological and medical applications due to their excellent biocompatibility, chemical inertness, and superior mechanical properties. In order to attend biomedical applications, there is an increasing interest in developing antibacterial coatings. In this paper, we investigated the bactericidal properties of diamond-like carbon films produced using...
Three different configurations of magnetic traps were set up by changing the number of central magnets in a Triode Magnetron Sputtering system, where the anode consists of a grid positioned at a distance from an aluminum target on the cathode. The grid and the wall chamber are grounded and the plasma is formed in the space between the target and the grid. The current–voltage (I–V) characteristics...
In this paper, p-type hydrogenated nanocrystalline (nc-Si:H) films were prepared on corning 7059 glass by plasma-enhanced chemical vapor deposition (PECVD) system. The films were deposited with radio frequency (RF) (13.56 MHz) power and direct current (DC) biases stimulation conditions. Borane (B 2 H 6 ) was a doping agent, and the flow ratio η of B 2 H 6 component...
A Taguchi Matrix was used for the experimental design to study the CVD diamond deposition parameters in a cold-wall HFCVD reactor. Gas composition, total gas pressure, total mass flow and substrate temperature were considered as controllable factors, and three levels for each of these factors were selected, in an L9 orthogonal array. A new Figure-of-Merit (FOM) is proposed to assess the best combination...
Double electrostatic probe method and Boltzmann-plot method are applied to measure the electron temperature and the excitation temperature of a DC laminar argon plasma jet generated at reduced pressure. Attempts are also made to measure the gas temperature by using a pair of WRe-5/26 thermocouple. Experimental results show that the measured excitation temperature at the jet center increases with the...
Numerical solutions for the sorption problem for the films of the solid solutions of the reactive metal under a constant pressure P of the sorbed gas have been found. These solutions depend on the value of the kinetic coefficient H, which is proportional to gas pressure P. According to the found dependence the relative sorption capacity S of the getter film is the larger the smaller is pressure P,...
Different rotation speeds of the substrate about its surface normal were used to produce sculptured copper thin films of ∼ 90 nm thickness. X-ray diffraction (XRD), atomic force microscopy (AFM) and scanning electron microscopy (SEM) were employed to obtain nano-structure and morphology of these films. Their optical properties were measured by spectrophotometry in the spectral range of 340–850 nm...
Pure aluminium coating was deposited on sintered NdFeB magnets by direct current (DC) magnetron sputtering to improve the corrosion resistance. The corrosion behaviour of sintered NdFeB coated with aluminium was characterized by potentiodynamic polarization measurement. The adhesive strength between the aluminium coating and the sintered NdFeB was characterised by vertical tensile test and high-low...
The quantity of silicon lost during evaporation is greater than theoretical expectation during the purification of metallurgical grade silicon by vacuum evaporation. In this paper, silicon volatilization rates were measured for evaporation times of 30, 45 and 60 min at 1723, 1773 and 1823 K, respectively. Results indicate that volatilization rates determined in our experiments are one or two orders...
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