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Ni films with a thickness of 45–240 nm were sputter-deposited on HCl-doped polyaniline (HCl-PANI) substrates at 300 K, forming the Ni/HCl-PANI composites. All the Ni films grow with columnar grains. The grain size increases with increasing film thickness. A temperature dependence of the resistance within 5–300 K reveals that all the Ni/HCl-PANI composites exhibit a metal–semiconductor transition....
Molybdenum thin films are widely used as e.g. diffusion barriers in very large-scale integrated circuits and thin film transistor displays. For better understanding of the evolution of structure and properties, films with different thicknesses have been grown on glass substrates by magnetron sputter deposition. A comprehensive relationship between film thickness, microstructure, stresses and resistivity...
Monolithically grown as well as multilayered Al x Cr 1−x N coatings were deposited by cathodic arc evaporation using Al x Cr 1−x targets with compositions of x = 0.7, 0.75, 0.85, and 0.9. X-ray diffraction analysis revealed a single phase cubic structure for the monolithically grown nitride coatings using Al 0.7 Cr 0.3 and Al 0.75 Cr 0.25...
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