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Sputtering, a physical vapor deposition technique, is widely used for preparation of compound coatings. Binary, ternary or multi component compound coatings deposited by sputtering find a variety of applications. The properties of these coatings depend strongly on the composition of the films. A mathematical model has been developed to predict the composition of the metallic constituents of the coatings...
In this work, Ti–Cu–N hard nanocomposite films were deposited on 304 stainless steel (SS) substrate by using pulse biased arc ion plating system with Ti–Cu alloy target. The effects of negative substrate pulse bias voltages on chemical composition, structure, morphology and mechanical properties were investigated. The composition and structure of these films was found to be dependent on the pulse...
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