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Electromagnetic acceleration plasma generators, which are called magneto-plasma-dynamic (MPD) arcjet generators, can produce higher-velocity, higher-temperature and higher-density plasmas than those of conventional thermal plasma torches, because MPD arcjet plasma is efficiently accelerated by electromagnetic body forces in MW-class input power operation. These properties are effective for deposition...
The injection of nitrogen ions into pure titanium has been performed by the plasma-based ion implantation with a negative voltage of 10kV, pulse width of 10μs and a repetition rate of 100Hz. The ESCA/AES analysis indicates the nitrogen deposition with a peak at 27nm from the surface and the formation of TiN. The dissolution current density of the implanted samples was decreased about two orders of...
Pinhole defects of TiN films deposited onto stainless steel by a few dry coating processes were evaluated potentiodynamically in a deaerated 0.5kmol/m 3 H 2 SO 4 +0.05kmol/m 3 KSCN solution at 298K. The critical passivation current density i crit in the TiN films prepared by activated reactive evaporation method decreased considerably with increasing...
Recent investigations of the dynamics of pulsed direct-current discharges relevant for the production of titanium nitride coatings by plasma-assisted chemical vapour deposition in large reactors have shown that, when titanium tetrachloride is used as a feed stock gas, the spreading of the discharge is slow, reaching some parts of the reactor with substantial delay. The result is a non-uniform plasma...
A sheet plasma of several millimeters in thickness produced by a combination of a pair of strong dipole magnets with opposing fields and a pair of Helmholtz coils producing a magnetic mirror field was used in the deposition of titanium nitride (TiN). Plasma limiters encasing a ferrite magnet and a coreless magnetic coil add to the mirror field, enhancing quiescence in the plasma. The sheet plasma...
The preferred orientations of TiN films deposited by various PVD processes have been extensively studied. However, deriving a general trend to illustrate the effect of a single process parameter is difficult since other process parameters also affect the evolution of the preferred orientation during the deposition. This study presents a combined index, S E /Temp( o K), to characterize...
The relationship between deposition conditions of TiN film deposited by arc ion plating and the resultant structure was investigated by X-ray diffraction. Bias voltage was varied systematically in order to clarify the effect of such a variation on the final structure of TiN films. At low bias voltage, the resultant TiN film exhibited strong {110} preferred orientation, whereas at high bias voltage,...
The present research has been conducted aiming the study of mechanical characteristic improvement of Ti6Al4V alloy surface. The proposed process is based on an ion nitriding method performed in a low intensity plasma jet reactor. An objective of the study is to enlarge the applicability of this alloy in several industrial areas, mainly foccusing the biomedical applications. The reactor of low intensity...
Titanium nitride (TiN) thin films were prepared by means of reactive DC sputtering on quartz and sapphire substrates. Structural, electrical and optical effects of deposition parameters such as thickness, substrate temperature, substrate bias voltage were studied. The effect of substrate temperature variations in the 100-300 o C range and substrate bias voltage variations in the 0-200V DC...
We employ in situ high-temperature (1030-1250K) scanning tunneling microscopy to measure adatom island coarsening/decay kinetics and temporal fluctuations around the equilibrium shapes of two-dimensional TiN vacancy islands on atomically-smooth (001) and (111) TiN terraces. Using inverse Legendre transformations of the equilibrium island shapes, we obtain relative step energies as a function of step...
Carbon doped titanium nitride (TiN) films were prepared on a stainless-steel (304SS) substrate using both techniques of dynamic ion mixing and N 2+ ion irradiation in an ethylene gas atmosphere. The composition and structure of the films were measured by analyzer of X-ray photoelectron spectroscopy and X-ray diffraction. The Knoop hardness and friction coefficient of the films were measured...
Residual stresses in TiN films on a steel substrate were investigated with ordinary in-lab X-ray equipment and a synchrotron radiation device that emits ultra-high-intensity X-rays. Specimens prepared in this study were TiN films with different thicknesses deposited on a stainless-steel substrate by arc-ion plating. The minimum thickness that allows the residual stress measurement was 0.8μm by in-lab...
In this study, the growth kinetics of titanium nitride layer deposited on pre-nitrided AISI 1020 steel samples by thermo-reactive diffusion (TRD) techniques in a solid medium was reported. Steel was at first tufftrided and then titanium nitride coating treatment was performed in a powder mixture consisting of ferro-titanium, ammonium chloride and alumina at 1173, 1223 and 1273K for 1-4h. Titanium...
Titanium nitride and chromium nitride coatings were formed on a gray cast iron by condensation from a plasma phase in vacuum with the ion bombardment of the sample surface by titanium or chromium plasma flows in a residual nitrogen atmosphere. The element and phase composition of coatings were studied before and after annealing for 1–43h in air at temperature 700°C using Auger electron spectroscopy...
TiN coatings can be obtained in a relatively wide range of compositions around stoichiometry. Changing the stoichiometry around the 1:1 composition broadens the spectrum of colors and can modify the mechanical properties as compared with those of stoichiometric TiN. In this work, we present the deposition of TiN coatings by using a metallic Ti cathode and varying the nitrogen partial pressure in a...
The paper reports the synthesis of nano-crystalline ceramics like titanium dioxide and titanium nitride using a plasma chemical experimental reactor powered by a multi-segment (cascaded) arc plasma torch. The precursor-laden plasma beam emerging from the torch anode section expands supersonically through a converging nozzle to a low-pressure collection chamber. This results in a uniform and controlled...
Thin titanium nitride (TiN x ) films were deposited on silicon substrates by means of a reactive DC-magnetron plasma. Layers were synthesized under various conditions of discharge power and nitrogen flows in two operation modes of the magnetron (the so-called “balanced” and “unbalanced” modes). The optical constants of the TiN x films were investigated by spectroscopic ellipsometry...
In this study, titanium nitride (TiN) deposition by reactive spraying was carried out under a low-pressure environment using a DC arc plasma jet generator with a supersonic expansion nozzle. Titanium powders were injected using a hollow cathode with argon gas, and nitrogen or nitrogen and hydrogen mixture was used as the plasma gas. Microstructure and properties of the coatings were examined using...
The pre-treatment of work-piece surfaces is decisive for improved adhesion of tribological, decorative, sensor, biocompatible, etc. coatings subsequently deposited by vacuum coating techniques. Most current industrial techniques (mainly glow discharges) miss the requirements for activating temperature-sensitive and electrically insulating materials. Gridless plasma sources like the linear anode layer...
The effect of the base pressure on the incorporation of oxygen into reactively magnetron-sputtered metal-nitride films has been investigated. A UHV sputtering system with a base pressure of less than 10 −6 Pa was used to examine the relationship between a deliberately introduced background pressure of oxygen and a measured oxygen content in the sputter-deposited TiN films. The results showed...
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