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Metallic zinc film with various surface roughnesses was deposited on Si (100) substrates by ion beam sputter deposition utilizing beam energies at 8, 12 and 16 keV. The surface roughness of the metallic zinc film increased as ion beam energy increased and was found to act as a crucial factor for the formation of ZnO nanowires by subsequent thermal oxidation. ZnO nanowires with diameters of ∼30 nm...
Nano-carbon needle films (NCNFs) coated with a 5-nm Au layer were prepared on p-type Si (100) substrates by means of quartz-tube type microwave plasma chemical vapor deposition (MWPCVD) at different total gas pressures and an electron beam (EB) method. The NCNF deposited at the total gas pressure of 60 Torr had better field emission (FE) characteristics due to the dense structure of carbon sheets,...
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