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We discuss a new EB resist material that has an alicyclic (bulky) acetal protecting group, with a hydrophilic group in its chemical structure. We synthesized it by acid catalyzed reaction of poly(hydroxystyrene, PHS) with hyper lactonyl adamantyl vinyl ether (HPVE). AFM analysis showed that the resist composed of HPVE polymer exhibits a uniform dissolution property. And the etching durability was...
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