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There is an increasing demand for high-resolution three-dimensional (3D) structures as for instance micro-optical lenses or blazed gratings. The fabrication of these requires electron beam lithography for patterning. 3D structure shapes can be predicted by using simulation tools to reduce cost and development effort. For this, different resist models have been presented. However, currently available...
Grayscale patterning is technologically relevant in the fabrication of micro-optics elements, microfluidics, micro-electromechanical devices, to name a few. So far, the state-of-the-art is limited to micrometric scale, which is of interest for optical applications in the visible spectrum. In this work, we used extreme ultraviolet light and an interference lithography method to demonstrate the feasibility...
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