The present work reports on the structural and transport properties of nanostructured Fe in thin Cr films, produced by implantation of Fe + ions. The implantation process introduces defects in these films forcing accommodation to take place during and after the process that induce the segregation of immiscible species. This gives rise to the nanostructured Fe granules in much faster time scales than when conventional processes are used. A comparison is made with systems produced by depositing Fe between Cr layers by means of the arc-vacuum deposition method at equivalent concentrations.Resistivity versus temperature curve shows a clear minimum at fairly high temperatures for the implanted samples only. This effect is probably due to electronic interactions with the Fe nanostructures formed by segregation and to coupling with defects.