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Deposition–precipitation with urea (DPu) was used to deposit copper on TiO2 and prepare metal Cu/TiO2 catalysts with different Cu loadings from 0.6 to 4.2wt%. Cu2+ complexes adsorb on TiO2 at pH lower than PZCTiO2 (around 6), i.e., when the titania surface is supposed to be positively charged. To attempt to explain these results, a study on the deposition behavior of Cu2+ was carried out as a function...
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