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Transparent conducting ZnO:Al and ZnO films of 380–800 nm thickness were deposited on glass substrates by filtered vacuum arc deposition (FVAD), using a cylindrical Zn cathode doped with 5–6 at.% Al or a pure Zn cathode in oxygen background gas with pressure P=0.4–0.93 Pa. The crystalline structure, composition and electrical and optical properties of the films were studied as functions of P. The...
TiC x O y films with various O/Ti ratios have been deposited by DC magnetron sputtering, using C pieces incrusted in a Ti target erosion area. Composition analysis revealed the existence of three different growth regimes: (i) zone I, corresponding to films with metallic-like appearance, and atomic ratios O/Ti below one; (ii) zone II, with films revealing interference-like colours,...
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