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Low-dielectric-constant fluorinated amorphous carbon films have been prepared from the low global-warming-potential gas of C 5 F 8 by a capacitively coupled plasma enhanced chemical vapor deposition method. Films were prepared at substrate temperatures as high as 400 o C. The obtained deposition rate of 15-65 nm/min was higher than that of conventional C 4 F 8 ...
A plasma-solid surface reaction on the nanometer scale was observed in situ for the first time. This was achieved by employing special scanning tunneling microscopy (STM) that could be operated in a plasma environment. To prevent current due to noise from the plasma, the probe tip was coated with epoxy grease and insulating glass. The apex of the probe tip was sharpened by a focused ion beam (FIB)...
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