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We present the simulations of molecular beam epitaxy (MBE) growth using a rate equation (RE) model and its comparison with Monte-Carlo (MC) simulations. The advantage of the RE model is the higher speed of calculations, so a much shorter time is required for obtaining results. The RE model is described by a set of differential equations that calculate at each time interval the change of the N(kj)...
We report an extensive Monte Carlo study of film growth by molecular beam epitaxy. A solid-on-solid model is used on L L substrate sizes, with periodic boundary conditions. Both deposition and diffusion occur simultaneously; several elementary rules for activated atom hopping are used with only simple interactions between nearest neighbor sites allowed. These rules include preferential or random...
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