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The current experiment deposits Mo–Ru coatings with a Ti interlayer on silicon wafers by sputtering at 400°C. The annealing treatments were conducted at 600°C under atmospheres consisting of controlled oxygen contents with balanced nitrogen. After annealing in a 10ppm O 2 –N 2 atmosphere, surface roughness increased, apparently due to the formation of external island oxides. While...
Fluorine doped transparent conductive tin oxide thin films (FTO) of different surface roughness have been deposited by chemical vapor deposition (FTO SOL ), classical chemical spray pyrolysis (FTO CSP ), and spray pyrolysis onto heated substrates using infra red irradiation (FTO IRSP ); the three deposition methods inducing different surface roughness. It was found that the...
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