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This paper concentrates on the deposition of Ta, TaN and TaNO thin films by r.f. magnetron sputtering in Ar/N 2 /O 2 gas mixtures. The film properties and their suitability as diffusion barriers and protective coatings in silicon devices were characterized using four-point probe measurements, Auger electron spectroscopy, Rutherford backscattering, glancing angle X-ray diffractometry,...
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