The Infona portal uses cookies, i.e. strings of text saved by a browser on the user's device. The portal can access those files and use them to remember the user's data, such as their chosen settings (screen view, interface language, etc.), or their login data. By using the Infona portal the user accepts automatic saving and using this information for portal operation purposes. More information on the subject can be found in the Privacy Policy and Terms of Service. By closing this window the user confirms that they have read the information on cookie usage, and they accept the privacy policy and the way cookies are used by the portal. You can change the cookie settings in your browser.
High surface potential stability has been realized by postannealed SiO 2 electret thin films prepared on Si substrates using various deposition methods: r.f. magnetron sputtering, metalorganic chemical vapor deposition, utilizing electron cyclotron resonance plasma and vacuum arc plasma evaporation. It was found that the surface potential stability of SiO 2 thin films prepared by these...
Hard silicon dioxide (SiO 2 ) films were prepared by means of microwave plasma-enhanced CVD (MPECVD) using trimetylmethoxysilane (TMMOS) and CO 2 as a row material and as an additive gas, respectively. The substrate temperature remained below 373 K. After preparation of the SiO 2 films, the film surfaces were treated through a chemical method, that is, preparation of self-assembled...
Set the date range to filter the displayed results. You can set a starting date, ending date or both. You can enter the dates manually or choose them from the calendar.