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Physical vapour deposition technology is well suited to the deposition of advanced TiAlN-based coatings. Among these thin films, multilayer systems consisting of stacked layers of metallic Ti1−xAlx and nitride Ti1−xAlxN with x around 0.5 are expected to have improved mechanical properties with respect to single nitride layers of the same composition. A set of Ti0.54Al0.46/Ti0.54Al0.46N multilayer...
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