The use of working stamps for nanoimprint lithography is highly interesting due to a number of reasons. We present results of such a master stamp – working stamp – imprint process where we achieved a resolution of 12.5nm half pitch. To fabricate master stamps for nanoimprint lithography we use massively parallel ion beam lithography provided by the CHARPAN Tool. Exposed and developed hydrogen silsesquioxane (HSQ) on Si is directly used as a master to fabricate working stamps from UV-curable polymers, which are then used for UV-based nanoimprint lithography.