We present a novel method for 3D microfabrication with LIGA process that utilizes a deep X-ray mask in which a microactuator is integrated. The integrated microactuator oscillates the X-ray absorber, which is formed on the shuttle mass of the microactuator, during the X-ray exposures to modify the absorbed dose profile in X-ray resist, typically PMMA. The 3D PMMA microstructures according to the modulated dose contour are revealed after GG development. An X-ray mask with integrated comb drive actuator is fabricated using deep reactive ion etching, absorber electroplating, and bulk micromachining with silicon-on-insulator wafer. Silicon shuttle mass (1mmx1mm, 20μm thick) as a mask blank is supported by four 1mm long suspension beams and is driven by the comb electrodes. A 10μm thick, 50μm line and spaced gold absorber pattern is electroplated on the shuttle mass before the release step. The fundamental frequency and amplitude are around 3.6kHz and 20μm, respectively, for a dc bias of 100V and an ac bias of 20V P - P (peak-peak). Fabricated PMMA microstructure shows 15.4μm deep, S-shaped cross-section in the case of 1.6kJcm - 3 surface dose and GG development at 35 o C for 40min.