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Reactive magnetron co-sputtering of two confocal SiO 2 and Er 2 O 3 cathodes in argon–hydrogen plasma was used to deposit Er-doped Si-rich SiO 2 layers. The effects of the deposition conditions (such as RF power applied on each cathode and total plasma pressure) and annealing treatment (temperature and duration) on structural, compositional and photoluminescence (PL)...
The structural and optical emission properties of Er-doped silicon-rich silica layers containing 10 21 atcm −3 of erbium are studied as a function of deposition conditions and annealing treatment. Magnetron co-sputtering of three confocal targets (Si, SiO 2 and Er 2 O 3 ) under a plasma of pure argon was used to deposit the layers at 500°C. The silicon excess...
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