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Films of a ternary alloy of composition Ti 34 Si 23 N 43 and of a structure consisting of homogeneously distributed ~2nm sized TiN-like grains in an amorphous matrix were deposited by reactive magnetron sputtering to thicknesses of 250-1000nm and then oxidized with steam at 600, 800, or 1000 o C, with and without first annealing the film in vacuum at...
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