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The growth of the target erosion profile (racetrack) in DC magnetron sputtering has been experimentally studied at a modest target power. Unbalanced magnetron sputtering (UBMS) and balanced magnetron sputtering (BMS) of a copper target were conducted at Ar gas pressures between 0.38–2.0Pa at a constant DC discharge power of 100W. At time intervals of several hours throughout the target life, the target...
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