A torch-like plasma generator we developed to make low temperature material processing possible in open air conditions was employed for the deposition of TiO 2 films on substrates exposed to air. Ti(OEt) 4 or Ti(O-iPr) 4 vapor was fed into the plasma generated in an insulator nozzle lining the inner surface of a grounded cylindrical anode and containing a metal needle cathode at the center. The homogeneous plasma with T c of 1.8 eV and T g of 200°C, respectively, could decompose Ti(OR) 4 to flush decomposition species onto a substrate placed in air. The film thus prepared was stoichiometric and amorphous TiO 2 , but contained short-range crystallinity. The phase structure of the films changed by the admixing of hydrogen in the plasma. The TiO 2 film deposited from a TEOT/H 2 mixture had a high breakdown electric field (1.2 MV cm - 1 as well as a high dielectric constant (ε = 54) even in amorphous phase.