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Time-resolved cavity ringdown (τ-CRD) spectroscopy has been applied to monitor the silyl (SiH 3 ) radicals and nanoparticles in a pulsed very high frequency (VHF) silane-hydrogen plasma under microcrystalline silicon (μc-Si:H) deposition conditions. The measured cavity loss reveals four time intervals (I up to VI) in the first 4s of the plasma pulse. By variation of the laser wavelength, it...
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