KTa 0.65 Nb 0.35 O 3 (KTN) thin films were deposited on amorphous glass substrates using a range of single buffer layers such as indium tin oxide (ITO), zinc oxide (ZnO), 3at% Al-doped ZnO (AZO), and 3at% Ga-doped ZnO (GZO), as well as a variety of multi-buffer layers such as SrTiO 3 (STO)/ITO, STO/ZnO, STO/AZO, and STO/GZO using a pulsed laser deposition system. All films showed a polycrystalline perovskite phase with the exception of all single buffer layers and STO/ITO multi-buffer layers. The STO buffer layer is important for crystallizing KTN films due to the similar lattice constant and same crystal structure. The optical transmittance of all films exhibited a transmittance ⩾90% in the wavelength range.