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Ion sputtering is employed to produce structures on the nanometer scale. The surface morphology of Au(111) after sputtering with 500eV Ar + ions at various sputtering temperatures (from room temperature (RT) to 150°C with variation of 25°C) has been investigated by scanning tunneling microscopy (STM). It is shown that the sputtering temperature can be used to determine the final surface morphology...
Sputter depth profiling of nanostructures requires quantitative thin film analysis with high accuracy and with optimum resolution. More recently, powerful quantification models, such as the so-called mixing roughness information depth (MRI) model, have increased the accuracy of depth profiling to the sub-monolayer region. Using the MRI model, interdiffusion coefficients at nanolayer interfaces can...
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