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Substrates of aluminium alloy 2011 were plasma nitrided using an inductively coupled plasma source. The plasma nitriding parameters of temperature, length of nitriding and negative dc bias of the substrates were varied in order to optimise the plasma nitriding process. Substrates were characterised by powder X-ray diffraction (XRD), X-ray photoelectron spectroscopy (XPS) and scanning electron microscopy...
Substrates of aluminium alloy 2011 were plasma nitrided using an inductively coupled plasma source and characterised in situ using X-ray photoelectron spectroscopy (XPS). The maximum entropy method (MEM), used for sharpening the spectra, has enabled the identification of metallic Al and AlN at binding energies of 72.7 and 74.4eV, respectively. Other peaks at 73.4, 75.0, 75.5 and 76.2eV are ascribed...
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