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ZnO thin films on (0001) sapphire large area substrates (Φ50×0.43mm) have been deposited by atmospheric pressure MOCVD. To investigate the effects of post-annealing treatment on the structural and luminescent properties of ZnO thin films, films have been annealed in nitrogen at various annealing temperatures from 400 to 800°C. The best crystal quality of ZnO films was obtained with annealing temperatures...
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