A new approach to nanostructure formation based on replication of an existing pattern of colloidal Au nanoparticles is described. The key steps in this strategy involve the coating of a well-defined Au colloid monolayer with an SiO x sol-gel, HF etching until colloidal particles are exposed, and removal of colloidal Au with aqua regia. This process was carried out on a two-dimensional array of 12nm diameter particles on an In-doped SnO 2 (ITO) substrate, and monitored by UV-vis, electrochemistry, and atomic force microscopy (AFM). AFM data indicate the strategy is feasible, with clearly visible differences in surface morphology observed between bare ITO and colloidal Au-depleted, SiO x -coated ITO.