Ion beam deposition (IBD) is a thin film production method for direct deposition of low-energy mass-analyzed ions. The mass-analyzed beam acts as an exceptionally clean particle source which, when combined with an ultra-high vacuum (UHV) deposition chamber, results in very high purity structures. The IBD technology has been applied for deposition of single Au - , single N + and dual Au - and N + depositions on glassy C substrates. For the first time, the growth of Au islands on C by single Au - or dual Au - and N + deposition is reported.