Nanolaminate (nanomultilayer) thin films of TiO 2 and Ho 2 O 3 were grown on Si(001) substrates by atomic layer deposition at 300°C from alkoxide and β-diketonate based metal precursors and ozone. Individual layer thicknesses were 2nm for TiO 2 and 4.5nm for Ho 2 O 3 . As-deposited films were smooth and X-ray amorphous. After annealing at 800°C and higher temperatures the nanolaminate structure was destroyed by solid-state reaction to form Ho 2 Ti 2 O 7 . The films demonstrated diamagnetic or paramagnetic behaviour in the as-deposited state. After annealing, the films possessed net magnetic moment, allowing one to record saturation magnetization and weak coercivity.