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TiO2 thin film was deposited by Plasma Assisted Chemical Vapor Deposition (PECVD), and TiOx (0 < x < 2) thin film was synthesized by plasma assisted reduction. The microstructure and morphology of the thin films were determined by SEM and TEM. The crystallization was characterized by X-ray Diffractometer, and surface chemical states were determined by XPS. The structural fingerprint was observed...
Black-ZrO2 thin films were successfully fabricated on the surface of a Zr metal plate by simple oxidation at a controlled temperature in air, under normal atmospheric pressure. The black-ZrO2 thin films were composed of two types of grains with monoclinic ZrO2 structures: 1) fine equiaxed grains with sizes of up to a few hundred nanometers from the surface to a depth of about 5 μm; 2) columnar grains,...
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