TiO 2 - x films were prepared by ion beam assisted deposition on an EATON Z-200 system, during which concurrent electron beam evaporation of titanium and bombardment with an inert gas ion beam were carried out in an O 2 atmosphere. Xe + and Ne + ions with different current density and incident angles were used. The films were investigated using X-ray diffraction (XRD), glancing incident X-ray diffraction (GIXRD), X-ray photoelectron spectroscopy (XPS) and Rutherford backscattering spectroscopy (RBS). RBS analysis shows that the films are nearly stoichiometric. XPS measurements reveal that the surface was fully oxidized, but Ti 2 + , Ti 3 + and Ti 4 + coexist on the Ar + -sputtered surface. XRD and GIXRD analyses show that almost all the films have rutile-type structure and (200) preferred orientation. After annealing the 2θ angle shift to higher degrees and the (200) peak intensity increases, which means better crystallization and orientation.